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Reuterweg 65
•
D-60323 Frankfurt/M • Tel
+49 (0)69-720040 • Fax
+49 (0)69-720400 •
info@tectra.de
Impressum
AGBs
H-flux
H-flux Atomic Hydrogen Source with optional shutter
The new H-flux Atomic Hydrogen Source* works by thermally dissociating
hydrogen in an electron bombardment heated fine tungsten capillary
(thermal hydrogen cracker). By bouncing along the hot walls the
molecular hydrogen is cracked to atomic hydrogen. This is e.g. very
useful for in-situ, damage free cleaning of residual oxygen prior to
sample coating or analysis. Other applications are in surface
modifications appreciating the high reactivity of atomic species.
The H-flux Atomic Hydrogen Source is UHV compatible and mounted on a
NW35CF (2.75"OD) flange, making the source an easy retrofit to existing
vacuum systems.
Applications:
Atomic Hydrogen can be used in surface science and
thin film technolgy (MBE, GSMBE) mainly for the following applications:
damage free in situ cleaning e.g GaAs, InP, Ge and
Si. Removal of residual oxygen and carbon.Low temperature cleaningSurfactant - improvement of layer properties during growth post growth surface treatment/improvement chemical passivation and surface reconstruction annealing of amorphous silicon
Key Features:
Key features of the H-flux Atomic Hydrogen Source
are the zero residual ion current and almost 100% cracking efficiency,
due to the superior and unique Bertel design. Integral watercooling is
included as standard to minimise heat load in the system and
outgassing. A manual shutter is available as option.
Zero residual ion currentAlmost 100% cracking efficiencyIntegral water-cooling as standard to minimise heat load in the system
and outgassing Capable of operation in UHV without differential pumping Thermocouple and PID controller as standard for reproducible and
constant operation Filament made of standard Tungsten wire for inexpensive on-site
replacement
Specifications:
Typical operating conditions: the flux of Hydrogen atoms at 10-9 mbar
in a chamber with typical pumps at a distance of 10cm is ca. 5x1013
atoms/cm².
Source Properties:
Gas Flow:
10-5 sccm to 1sccm
Operating Pressure:<10-10 to 10-5 mbar
Hydrogen Flux: ~5x1013 atoms/cm² @ 10cm distance and 10-9 mbar
Beam Divergence: ~15° half angle
Source Hardware:
High Voltage:1,2kV (max) adjustable
Beam current: 50mA (max) adjustable
Power:60W (max) adjustable via voltage and current
In vacuum length: 190mm (without shutter)
In vacuum diameter: 34mm (max)
Mounting Flange:NW40CF (2.75")
Leak valve: required (see option)
Integral cooling:water
Bakeable:200°C
Power Supply:
HV connection via over-specified high voltage
feedthrough with matching connector potted onto the cable and screw-on
retaining sleeve for high-level user safetyAll feedthroughs are user demountable for on-site service/repair Filaments are easily replaced and user fabricated from 0.3mm tungsten
wire of near zero running costs Water-cooled copper jacket to minimise radiated heat and outgassing Water connection via 1/4” Swagelok fittings Gas connection via mini-Conflat (NW16CF) flange Additional spare NW 16CF ports on the multiport for future upgrade with
the options listed above 19" rack mount, 3U high, 230VAC/50Hz (115VAC/60Hz optional)
Options:
Manual shutter: can be operated and closed within
the ID of an DN40CF port.Shutter actuator: for remote/computer controlled shutter operation.
References:
"Simple source of atomic hydrogen for ultrahigh
vacuum applications", U. Bischler and E. Bertel; J. Vc. Sci. Technol. A
11(2), Mar/Apr 1993
"Quantitative characterisation of a highly effective atomic hydrogen
doser", C. Eibl, G. Lackner, and A. Winkler. J.; Vac. Sci. Technol. A
16(5), Sep/Oct 1998.
Atomic Hydrogen Source (front view)
* In cooperation with Prof. Dr. E. Bertel of the
University of Innsbruck
In the interests of continuous product development,
specifications are subject to change without notice.
Quick links to other major tectra products:
Electron
Beam Evaporator -
4-pocket e-beam evaporator - Plasma
Source - Atomic
Hydrogen Source - Sputter Gun - Mini-Coater Deposition
System - Sputter-Coater
